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Optical spectroscopy and imaging – Characterization of plasma sources

Plasma technologies are frequently an essential element in deposition processes. Knowledge of this phase by spectroscopic characterization (LIBS, LIF, absorption, ...) and fast imaging provides valuable information for better control and process optimization. We have developed in the laboratory a time resolved diagnosis of UV-visible spectroscopy and fast imaging (ns resolution). It has been applied to characterize the dynamics of a laser ablation plume obtained from complex targets of metal oxide (CaCu3Ti4O12, Ba0.6Sr0.4TiO3). Experimental results coupled to a code(*) computing the spectral radiance of the plasma allowed us to estimate characteristic parameters of these non-uniform media, i.e. temperature and density of species at any point along plasma plume. This type of diagnosis will shortly be applied to the optical characterization of a process including micro-plasma discharges.

(*): Jörg Hermann (LP3, UM3 6182, University of Aix-Marseille - France)

Radial distribution of temperature and electronic density at Z = 13.3 mm, P(O2) = 30 Pa, F = 2.7 Ba0.6Sr0.4TiO3 target.